Formulation of novel electroless plating process for Cu and Cu-P alloys
En este estudio se optimiz ̤una nueva formulacin̤ de cobreado qum̕ico con base en sulfato de cobre, formaldehd̕o, hipofosfito de sodio y EDTA+TEA. Se encontr ̤que este baǫ era estable y se mantuvo la operacin̤ por 2 h. Tambiň se percibi ̤que la incorporacin̤ de fs̤foro en la matriz de cobre aument...
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| Other Authors: | , , , , , |
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| Format: | Book |
| Language: | English |
| Subjects: | |
| Online Access: | Formulation of novel electroless plating process for Cu and Cu-P alloys |
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